CO₂ CW laser irradiation effect on monocrystalline silicon cells

The effect on monocrystalline silicon cells after being irradiated of CO2 CW laser was researched, the damage mechanism of which was analyzed. When the power density is relatively low that can’t cause physical damage to the cells, the performance of cells reduces temporarily because of the temperature increase between the irradiation; when the laser power density is high enough to cause physical damage to the cells, the performance of cells will fall permanently. The voltage-current characteristic curves and output power curves before and after irradiation were compared, damage morphology in the facular area was observed, it is concluded that the performance of monocrystalline silicon cells declines a lot after being irradiated by laser with enough power density, the primary reason is the