Han Min, Luo Chengmu, Wang Kechao, et al. PULSED X-RAY SOURCE IN PLASMA FOCUSJ. High Power Laser and Partical Beams, 1995, 07(03): 461-466.
Citation: Han Min, Luo Chengmu, Wang Kechao, et al. PULSED X-RAY SOURCE IN PLASMA FOCUSJ. High Power Laser and Partical Beams, 1995, 07(03): 461-466.

PULSED X-RAY SOURCE IN PLASMA FOCUS

  • This paper discribes DPF-2OOplasma focus device as a pulsed X-ray source. The main specifications of the device are:stored energy 250kJ, circuitinductance~50nH, operating voltage 20~45kV, maximum current 2.5MA. Aset of seventeen switchs of field distortion sparkgaps are parallelly used for discharge. Thejetter time is +lOns.Mather type DPF is adopted in discharging chamber.The X-ray yield measured is 50~90 J/shot and photon energy 3~60keV, when the pressu re of H,gas is 533~800 Pa in chamber and stored energy is 40kJ. The entire device is stably operated, andup to now,near lO4 shots of DPF-200 are conducted.
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