Application of microwave plasma technology to inertial confinement fusion target fabrication

This paper mainly discusses the application of microwave plasma technology in the field of the inertial confinement fusion(ICF) target fabrication, including films preparation, reactive ion beam etching(RIBE) and focused ion beam(FIB) etching, as well as the nano-metal particles synthesis and its surface polymer-coated modification. This technology is very useful to solve the problem occurred in ICF target fabrication and improve the quality of the ICF target produced.