Fabrication of cobalt nanothin film by pulsed laser deposition technology

This paper describes the fabrication of cobalt nanothin films by pulsed laser ablation of cobalt target in a hydrogen background gas. KrF laser and xy laser scanning apparatus is used, and cobalt target is rotated at a rate of 20Hz. The deposition environment and its effect on thin film surface morphology are analyzed, and mechanism of forming particles is discussed. The results show that under lower background gas pressure it inclines to form droplet because the collision among plasmas themselves is prominent. While isles and then form particles agglomerate under higher background gas pressure. Monodispersed cobalt nanoparticles grow at a repetition rare of 4Hz and 5Pa background gas.