Beam profile diagnosis technology for excimer laser

As widely applied in laser lithography and laser micromachining, excimer laser should have high stability and uniformity of beam intensity profile. This paper introduces the beam profile characteristics of excimer lasers and the beam profilometry. Experimentally, beam intensity profile of a XeCl laser and an ArF laser were diagnosed and evaluated by employing a computer with beam profile analyzer. The beam uniformity were also emphatically measured and discussed.