ZHANG Huihuang, LIN Zunqi, GU Zhongmin, et al. 2660Å UV LASER PLASMA PROBE AND INTERFEROMETRIC SYSTEMJ. High Power Laser and Partical Beams, 1989, 01(02): 169-174.
Citation:
ZHANG Huihuang, LIN Zunqi, GU Zhongmin, et al. 2660Å UV LASER PLASMA PROBE AND INTERFEROMETRIC SYSTEMJ. High Power Laser and Partical Beams, 1989, 01(02): 169-174.
ZHANG Huihuang, LIN Zunqi, GU Zhongmin, et al. 2660Å UV LASER PLASMA PROBE AND INTERFEROMETRIC SYSTEMJ. High Power Laser and Partical Beams, 1989, 01(02): 169-174.
Citation:
ZHANG Huihuang, LIN Zunqi, GU Zhongmin, et al. 2660Å UV LASER PLASMA PROBE AND INTERFEROMETRIC SYSTEMJ. High Power Laser and Partical Beams, 1989, 01(02): 169-174.
2660Å UV LASER PLASMA PROBE AND INTERFEROMETRIC SYSTEM
A 2660ÅUV optical probe and a Normaski interferometer available in UV wavelength are successfully developed in Six-Beam High Power Nd-glass Laser Facility.A visible CW laser is firstly applied in target imaging and alignment of the UV interferometer.0.6 nc electron density in laser-produced thick plasmas on cylindrical copper targets (φ500μm) has been measured.
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