Abstract: Laser-based approaches for graphene synthesis, reduction, modification, cutting and micro-patterning have been developed and applied to the fabrication of various electronic devices.General method utilized in direct laser writing and patterning of graphene was realized by controlling the movement of the sample or the laser reflecting mirror, while patterning by single shot laser is rarely reported.In the present study, a single shot laser patterning graphene method via light field modulating is proposed.Via controlling the light field by special light modulator (SLM), nanosecond laser pulses focused by objective lens were modulated to the desired pattern.The 4layer graphene in the laser irradiate region was damaged when laser energy was lager than 0.03 mJ.When the laser energy reached 0.06 mJ, clear pattern formed in graphene while no damage occurred in silicon base.The characteristics of graphene patterns were measured using Raman spectra imaging technology.The experimental results revealed that the light field modulated nanosecond laser remains potentially advantageous in graphene micro pattern processing with no need of moving the sample, quick processing and micrometer precision.