Abstract: Annealing is one of the most accessible post-treatment techniques in high power laser coatings, however, the impact of annealing on laser resistance of the coatings is not clear until today. In this experiment, HfO₂ films have been prepared by EBE, IBS and ALD techniques, respectively. The laser resistance of each film before and after annealing has been tested with the 1 064 nm Nd: YAG laser according to ISO 21254. It is found that the ALD HfO₂ film has the highest LIDT, while the IBS HfO₂ film has the lowest. It is also found that the laser resistance of all the samples does not benefit from the 300 ℃ annealing, moreover, the laser resistance of the ALD HfO₂ film decreases tremendously after annealing at 500 ℃. The experimental results are discussed and analyzed.