高功率微波对典型射频前端半导体器件损伤效应研究

Research on the damage effects of high-power microwave on typical RF front-end semiconductor devices

  • 摘要: 重点开展了高功率微波前门耦合对射频前端中核心半导体器件的损伤效应分析研究。首先梳理了高功率微波损伤半导体器件的损伤失效机制;然后,分析了脉宽、重复频率、脉冲个数等微波脉冲参数对半导体器件损伤效应趋势;最后,以典型的GaAs HEMT型低噪声放大器为实验对象开展了高功率微波注入效应实验,获得了器件毁伤阈值随微波参数的变化规律,验证了数十ns时间尺度下,脉宽、脉冲个数是影响半导体器件毁伤效应的关键因素。

     

    Abstract:
    Background High-power microwave coupling via the front-door path represents a primary mechanism for inflicting damage on receiving systems. To gain a deeper understanding of the underlying physics of these interactions, it is essential to investigate the vulnerability of receiver front-end.
    Purpose This paper focuses on the damage effects and failure mechanisms of typical RF front-end semiconductor devices when subjected to high-power microwave interference.
    Methods First, the fundamental damage and failure mechanisms of semiconductor devices are systematically reviewed. Subsequently, the trends in device damage effects are analyzed with respect to key microwave parameters, specifically pulse width, repetition frequency, and pulse number. Finally, injection experiments are conducted on a typical GaAs HEMT-type low-noise amplifier to observe device behavior under typical microwave parameters.
    Results The variation laws governing device damage thresholds in relation to microwave parameters are obtained through experimental characterization. The data reveals distinct correlations between the incident pulse characteristics and the device failure thresholds.
    Conclusions It is verified that on the timescale of tens of nanoseconds, the pulse width and the number of pulses are the dominant factors influencing the damage effects on semiconductor devices.

     

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