极端环境下GaN HEMT器件直流特性研究

DC characteristics of GaN HEMT under extreme environments

  • 摘要: 面向极端环境应用的氮化镓高迁移率晶体管因物性复杂与可靠性问题,制约了其广泛应用。本文提出了一种覆盖宽温域(2~350 K)、高真空与强电场条件的综合表征方法,系统研究了GaN/AlGaN异质结中二维电子气的输运特性及相关电学参数。通过直流与脉冲测试,获取了不同温度下的Ids-Vds输出特性与转移特性,并提取了阈值电压、饱和电流等关键参数。实验结果显示:阈值电压Vth与最大跨导Gmmax随温度变化呈非单调趋势,在180~240 K附近出现明显转折;在深低温条件下,转移曲线导数呈现双跨导峰结构,且随Vds增大,一峰向正栅压移动,另一峰向负栅压移动;同一器件在室温下的硬击穿电压约为170 V,而在200 K时约92 V开始出现电流上升,并于117 V发生硬击穿。通过宽温域氮化镓高迁移率晶体管直流特性的综合表征,本文为性能优化、陷阱效应机理识别及低温应用的器件与工艺优化提供了数据与方法学支撑。

     

    Abstract:
    Background GaN high electron mobility transistors for extreme-environment applications face limited adoption due to complex material physics and reliability concerns.
    Purpose This work presents a comprehensive characterization framework spanning a wide temperature range (2–350 K), high vacuum, and high electric field conditions to systematically probe two-dimensional electron gas (2DEG) transport in GaN/AlGaN heterostructures and extract relevant electrical parameters.
    Methods Using DC and pulsed measurements, we obtain temperature-dependent Ids-Vds output and transfer characteristics and extract key metrics such as threshold voltage and saturation current.
    Results The results show that the threshold voltage (Vth) and maximum transconductance (Gmmax) vary with temperature in a nonmonotonic manner, with a pronounced inflection near 180–240 K. Under deep-cryogenic conditions, the derivative of the transfer curve exhibits a double transconductance-peak structure; as Vds increases, one peak shifts toward more positive gate bias while the other moves toward more negative bias. For the same device, the hard breakdown voltage is approximately 170 V at room temperature, whereas at 200 K the current begins to rise near 92 V and hard breakdown occurs at 117 V.
    Conclusions By comprehensively characterizing GaN HEMT DC behavior across a wide temperature range, this study provides quantitative data and a methodological basis for performance optimization, identification of trap-related mechanisms, and device/process optimization for low-temperature applications.

     

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