用表面热透镜技术测量1315nm高反射硅镜弱吸收的研究

The study of weak absorption of the high reflection thin films coated on the Si plates at 1315nm by the STL

摘要: 运用表面热透镜技术精确测量了1315nm高反射硅镜的弱吸收，判断引起吸收的原因，从而为工艺上减少吸收降低损耗提供了保证。

Abstract: Using surface thermal lensing method to measure weak absorption of the thin films coated on the Si plates at 1315nm, we have concluded the reason that induced absorption, and can give a measuring guarantee to reduce their absorption and loss in the process of coating thin films．