X射线不同方向辐照80C196KC20单片机研究

80C196KC20 microprocessor irradiated by X-ray in different directions

  • 摘要: 为明确X射线不同方向入射对器件的影响,利用中国测试技术研究院的直流SJ-A X光机产生的X射线,从与垂直80C196KC20单片机表面不同方向角度对单片机进行辐照试验。试验结果显示,随着辐照角度由0°增加到90°,单片机所受的影响逐渐减小,90°时最不明显,表明此种单片机外壳在对其X射线总剂量效应的影响最大,原因在于X射线在不同方向照射时,需要穿过不同厚度的封套材料,X射线在此过程受到的衰减不同。

     

    Abstract: X-ray is produced by SJ-A X-ray tube in China Academy of Measurement and Test Technology, Chengdu,and 80C196KC20 microprocessor is irradiated by X-ray in different directions. The direction is defined along the line which is perpenticular to the surface of the microprocessor. The results of the test show that the effect of X-ray to the microprocessor decreases while the angle changes from 0° to 90°. The main reason is that X-ray may go through different thickness of the crust of device when the device is irradiated in different directions.

     

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