Fe掺杂氢化非晶碳薄膜制备及其热稳定性能

Preparation and thermal stability of Fe-doped hydrogenated amorphous carbon films

摘要: 以H2、反式-2-丁烯（T2B）和二茂铁混合气体为工作气体，用金属有机等离子体增强化学气相沉积法（PECVD）制备了Fe掺杂氢化非晶碳（a-C:H:Fe）薄膜。使用X射线光电子能谱（XPS）对a-C:H:Fe薄膜成分进行了分析。使用台阶仪、场发射扫描电镜（FESEM）、热重分析和紫外可见分光光度计（UV-VIS），对比分析了a-C:H薄膜和a-C:H:Fe薄膜的沉积速率、表面形貌、热稳定性和光学带隙变化。研究表明：相同制备条件下，相比a-C:H薄膜，a-C:H:Fe薄膜的沉积速率高，表面颗粒小，容易碳化，光学带隙变窄。

Abstract: Fe-doped hydrogenated amorphous carbon (a-C:H:Fe) films were deposited from T2B/ferrocene/H2 gas mixtures by plasma enhanced metal organic chemical vapor deposition(PEMOCVD). X-ray photoelectron spectroscopy(XPS) was used to probe the composition of deposited a-C:H:Fe films. Deposition rate, surface topography, thermal stability and optical gap were also measured by surface profiler, FESEM, thermal gravity analysis and UV-visible spectroscopy. The investigation results show that the deposition rate of the a-C:H:Fe films is rapider, and the surface grains are smaller than that of the a-C:H films. The a-C:H:Fe films are carbonized more easily than the a-C:H films, as their Tauc optical gap becomes 0.3 eV narrower than that of the a-C:H films.