脉冲强流电子束的发射度测量

EMITTANCE MEASUREMENTS FOR PULSED INTENSE ELECTRON BEAMS

  • 摘要: 本文描述了利用多孔板测量脉冲强流电子束发射度的原理和方法。考虑了空间电荷和轴向磁场对测量的影响。实验参量是阴极形状、阳极网孔、二极管距离和电压、电流幅值。在直线感应加速器上、用天鹅绒平面阴极和腐蚀的钨网阳极,当束能为1.32MeV、束流为2kA时,测得均方根发射度εrm=79cm.mrad,相应规一化亮度Bn=4.8×103A/(cm.rad)2

     

    Abstract: The principle and method of emittance measurements for pulsed intense electron beams using a multipinhole pin mask is described in the article.The effects of space charge and axial magnitic field on the measurements were considered.The experimental parameters were cathode type,anode mask texture.diode spacing and voltage,and beam current.A Emrms value of the emittance) of 79 cm.mrad was obtained with a planar velvet cathode an etched tungsten mask anode at the beam energy (E) of 1.32 MeV and the beam current (I) of 2kA on the LIA,corresponding normalized brightness (B) was 4.8 ×103 A (cm.rad).

     

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