低气压掺氪混合气放电XeF(C-A)激光

DISCHARGE XeF (C-A) LASER AT REDUCED GAS PRESSURE FOR A Kr-DOPING MIXTURE

摘要: 于0.22MPa气压和2.76MW/cm³泵浦速率下,在商品准分子激光器上实现放电激励XeF（C-A）宽带自由振荡。使用峰值净益为1.24％/cm的掺氪四元混合气,获得兰绿激光输出1.17mJ,比能量输出9mJ/L,增本征效率0.016％,中心波长477nm,带宽32nm（FWHM）。

Abstract: The free running XeF (C-A)lasing was achieved in a commercial discharge excited excimer laser at reduced gas pressure of 0.22MPa and moderate pump rate of 2.76MW/cm³, using a four-component gas mixture doped by Kr with a net peak gain of 1.24%/cm. The laser output, energy density and intrinsic efficiency were 1.17mJ, 9mJ/ L and 0.016%, respectively. The laser spectrum showed a peak wavelength at 477nm and a bandwidth of 32nm (FWHM).