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表面自纳米化抑制钛材料强电磁场真空击穿研究

华叶 蒋英东 吴平 曹亦兵 孙钧 陈昌华

华叶, 蒋英东, 吴平, 等. 表面自纳米化抑制钛材料强电磁场真空击穿研究[J]. 强激光与粒子束. doi: 10.11884/HPLPB202638.250446
引用本文: 华叶, 蒋英东, 吴平, 等. 表面自纳米化抑制钛材料强电磁场真空击穿研究[J]. 强激光与粒子束. doi: 10.11884/HPLPB202638.250446
Hua Ye, Jiang Yingdog, Wu Ping, et al. Investigation on suppression of vacuum breakdown in titanium materials under intense electromagnetic fields via surface self-nanocrystallization[J]. High Power Laser and Particle Beams. doi: 10.11884/HPLPB202638.250446
Citation: Hua Ye, Jiang Yingdog, Wu Ping, et al. Investigation on suppression of vacuum breakdown in titanium materials under intense electromagnetic fields via surface self-nanocrystallization[J]. High Power Laser and Particle Beams. doi: 10.11884/HPLPB202638.250446

表面自纳米化抑制钛材料强电磁场真空击穿研究

doi: 10.11884/HPLPB202638.250446
详细信息
    作者简介:

    华 叶,huaye@nint.ac.cn

  • 中图分类号: TN125,TN104.1

Investigation on suppression of vacuum breakdown in titanium materials under intense electromagnetic fields via surface self-nanocrystallization

  • 摘要: 为进一步提升相对论返波管高功率微波产生器的功率容量,本文提出一种采用表面自纳米化技术抑制相对论返波管强电磁场真空击穿的新思路,并通过实验研究了超声冲击和微粒子喷丸这两种技术对工业纯钛处理后的表面自纳米化效果、场致电子发射特性和强电磁场真空击穿性能。微观形貌和X射线衍射分析结果表明,超声冲击处理后在工业纯钛表层2~3 μm范围内形成梯度纳米化层,表面晶粒细化至约40 nm;微粒子喷丸处理后在工业纯钛表层30 μm范围内形成梯度纳米化层,表面晶粒细化至约48 nm。场致电子发射测试电场-电流曲线表明,表面自纳米化处理可以抑制场致电子发射,尤其是超声冲击处理可以显著抑制工业纯钛的场致电子发射。对比分析输出微波波形和结构壁损伤痕迹发现,超声冲击和微粒子喷丸处理可减弱微波尾蚀和结构壁损伤,证明其确实能够抑制慢波结构强电磁场真空击穿。
  • 图  1  TA2表面自纳米化处理前后的表面微观形貌

    Figure  1.  The surface micromorphology of TA2 prior to and subsequent to self-nanocrystallization treatments

    图  2  试样截面的金相显微组织

    Figure  2.  The cross-sectional microstructure of TA2 prior to and subsequent to self-nanocrystallization treatments

    图  3  TA2表面自纳米化处理前后的表面XRD图谱

    Figure  3.  The X-ray Diffraction (XRD) patterns of TA2 prior to and subsequent to self-nanocrystallization treatments

    图  4  TA2、USP-TA2、MSP-TA2的场发射电场-电流曲线

    Figure  4.  The field emission current-electric field characteristics of TA2, USP-TA2, and MSP-TA2

    图  5  X波段RBWO强电磁场真空击穿实验装置示意图

    Figure  5.  Schematic diagram of the X-band RBWO intense electromagnetic field vacuum breakdown experimental device

    图  6  微波功率5 GW条件下使用不同慢波结构在20 Hz刚开始连续工作600个脉冲的波形:CH1是二极管电压,CH2是二极管电流,CH3是在线微波波形,CH4是辐射场微波波形

    Figure  6.  Waveforms of the initial 600 pulses during the commencement of continuous operation at 5 GW microwave power with varied slow-wave structures at 20 Hz: CH1 represents the diode voltage, CH2 corresponds to the diode current, CH3 denotes the online microwave waveform, and CH4 signifies the microwave waveform of radiated field

    图  7  慢波结构环14000个脉冲实验后表面损伤微观形貌

    Figure  7.  Microscopic morphology of surface damage on slow-wave structure ring after 14,000 pulse experiments

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出版历程
  • 收稿日期:  2025-12-09
  • 修回日期:  2026-03-02
  • 录用日期:  2026-02-11
  • 网络出版日期:  2026-03-17

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