Abstract:
Background Although quartz exhibits excellent light transmittance, the significant difference in thermal expansion coefficients between quartz and metal sealing materials has long been a critical technical bottleneck, leading to interface stress concentration and vacuum sealing failures in low-leakage quartz windows.
Purpose This study addresses the urgent demand for ultra-high vacuum precision optical systems by conducting systematic research on sealing technologies for high-performance quartz vacuum windows.
Methods To overcome this challenge, this paper innovatively proposes using magnetron sputtering technology to sequentially deposit a Ti/Mo/Cu/Ag multilayer film system on the quartz welding surface, thereby creating a gradient functional metallization layer with thermal stress buffering capability that achieves effective surface metallization.
Results Scanning electron microscopy observations revealed continuous, dense, and structurally uniform film layers. Nanoindentation experiments further demonstrated a bonding strength of approximately 3.83 N between the metallized layer and quartz substrate, indicating robust adhesion. Experimental results show that vacuum window components fabricated using this metallization scheme achieve leakage rates below 10−12 Pa·L/s.
Conclusions This achievement has broad applications in synchrotron radiation, quantum measurement, and space exploration, providing crucial technical support for the development of high-performance vacuum devices.
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